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New gas analysis systems from Pfeiffer Vacuum for pressure ranges up to 50 mbar

Post Time:Aug 03,2012Classify:Industry NewsView:85

- High measurement speed, stability and resolution

- Easy system integration

- Intuitively operable software

 



With the gas analysis systems Sputter Process Monitor SPM 220 and High Pressure Analyzer HPA 220, Pfeiffer Vacuum has brought two new products onto the market. Both system solutions are based on the proven mass spectrometer PrismaPlus in combination with a dry compressing HiPace turbo pumping station and are used to monitor and document vacuum processes, such as coating architectural glass or thin-film solar cells. The SPM 220 as well as the HPA 220 are available in mass ranges of 1-100 and 1-200 amu; the HPA 220 is also available for 1-300 amu.

The Sputter Process Monitor SPM 220 is characterized by a specially developed ion source, which enables a direct connection between the analyzer and the process chamber. This enables the vacuum conditions of sputter processes and similar applications to be monitored at the precise moment up to a pressure of 10-2 mbar. An additional orifice system allows the pressure range to expanded up to 10 mbar.

The High Pressure Analyzer HPA 220 is available, depending on the application conditions, with three different gas inlet valves, both manually and electropneumatically operable. Its modular design impresses with a versatile vacuum solution for gas analysis in the pressure range from high-vacuum to 50 mbar.

The SPM 220 as well as the HPA 220 are equipped with a number of digital and analog inlets and outlets which enable their simple connection to super-ordinate control systems. The newly developed operating software is distinguished with a clearly laid out user interface as well as simple documentation of measurement results. Furthermore, it is possible to modify the software for special process requirements.


Source: http://www.glassonweb.com/news/index/16643/Author:

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